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张猛

      张猛      办公室:923         办公室电话:26925737

      2016年毕业于香港科技大学电子及计算机工程学系,获得哲学博士学位。同年加入香港科技大学先进显示与光电子技术国家重点实验室,担任研究员职位。2017年入职深圳大学电子科学与技术学院,任助理教授。长期从事低温高性能薄膜晶体管的研究。研究兴趣主要包括有机无机新材料薄膜晶体管的设计及制备,应用于先进显示中的高性能薄膜晶体管的研发及其相关电路设计,与薄膜晶体管相关联的各类传感器的研究。在IEEE TED、IEEE EDL、SID等国际顶级电子期刊与会议上发表论文50余篇。申请美国专利2项(授权1项),中国专利1项。主持和参与多项科学基金项目并担任多个SCI国际期刊匿名评审。

一、主要研究方向
1.超高性能硅基薄膜晶体管研究
2.低温金属氧化物薄膜晶体管研究
3.应用于先进显示中的薄膜晶体管研究及电路设计
4.基于薄膜晶体管的各类传感器研发

二、近几年主持的科研项目
1.国家自然科学青年基金 (批准号:61704109,2018. 1-2020. 12, 22万): “应用于AMOLED像素驱动电路中的多晶硅薄膜晶体管的退化机理研究”

三、代表性论文
1.Meng Zhang, Wei Zhou*, Rongsheng Chen, Man Wong, Hoi-Sing Kwok*, "Driving"-Stress-Induced Degradation in Polycrystalline Silicon Thin-Film Transistors and Its Suppression by a Bridged-Grain Structure, IEEE Electron Device Letters, 2017, 38(1): 52-55.
2.Meng Zhang, Zhihe Xia, Wei Zhou, Rongsheng Chen*, Man Wong and Hoi-Sing Kwok*, Dynamic-Gate-Stress-Induced Degradation in Bridged-Grain Polycrystalline Silicon Thin-Film Transistors, IEEE Trans. Electron Devices, 2016, 63(10): 3964-3970. 
3.Meng Zhang*, Zhihe Xia, Wei Zhou, Rongsheng Chen, Man Wong and Hoi-Sing Kwok, Significant Reduction of Dynamic Negative Bias Stress-Induced Degradation in Bridged-Grain Poly-Si TFTs, IEEE Electron Device Lett., 2015, 36(2): 141-143. 
4.Meng Zhang*, Wei Zhou, Rongsheng Chen, Man Wong and Hoi-Sing Kwok*, Characterization of DC-Stress-Induced Degradation in Bridged-Grain Polycrystalline Silicon Thin-Film Transistors, IEEE Trans. Electron Devices, 2014, 61(9): 3206-3212. 
5.Meng Zhang*, Wei Zhou, Rongsheng Chen, Man Wong and Hoi-Sing Kwok*, A Simple Method to Grow Thermal SiO2 Interlayer for High-Performance SPC Poly-Si TFTs Using Al2O3 Gate Dielectric”, IEEE Electron Device Lett., 2014, 35(5): 548-550. 
6.Meng Zhang*, Wei Zhou, Rongsheng Chen, Man Wong and Hoi-Sing Kwok, Water-Enhanced Negative Bias Temperature Instability in P-Type Low Temperature Polycrystalline Silicon Thin Film Transistors, Microelectronics Reliability, 2014, 54: 30-32. 
7.Meng Zhang*, Wei Zhou, Rongsheng Chen, Man Wong and Hoi-Sing Kwok, High-Performance Polycrystalline Silicon Thin-film Transistors Integrating Sputtered Aluminum-Oxide Gate Dielectric with Bridged-Grain Active Channel”, Semicond. Sci. Technol., 2013, 28: 115003.
8.Meng Zhang, Mingxiang Wang*, Xiaowei Lu, Man Wong and Hoi-Sing Kwok, Analysis of Degradation Mechanisms in Low-Temperature Polycrystalline Silicon Thin-Film Transistors under Dynamic Drain Stress, IEEE Trans. Electron Devices, 2012, 59(6): 1730-1737. 
9.Meng Zhang and Mingxiang Wang*, An Investigation of Drain Pulse Induced Hot Carrier Degradation in n-Type Low Temperature Polycrystalline Silicon Thin Film Transistors, Microelectronics Reliability, 2010, 50: 713-716. 
10.Meng Zhang, Mingxiang Wang*, Huaisheng Wang and Jie Zhou, Degradation of Metal-Induced Laterally Crystallized n-Type Polycrystalline Silicon Thin-Film Transistors under Synchronized Voltage Stress, IEEE Trans. Electron Devices, 2009, 56(11): 2726-2732.

四、专利
1.Hoi-Sing Kwok, Meng Zhang, Shuming Chen, Wei Zhou and Man Wong, “Thin film transistor with two-dimensional doping array”, US 9214568 B2. (已授权)
2.Hoi-Sing Kwok, Man Wong, Rongsheng Chen, Meng Zhang, Wei Zhou, “Metal-induced crystallization of amorphous silicon in an oxidizing atmosphere”, US 20160020095 A1.
3.张良芬,连水池,罗长诚,吴元均,徐源竣,郭海成,王文,陈荣盛,周玮,张猛,多晶硅薄膜的制备方法及多晶硅TFT结构,2015. 10. 21,中国,CN201510314265.3

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